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{"sheet":"実験ノート1","index":0,"n_rows":52,"n_cols":5,"rows_kept":52,"cut":false,"hidden":false,"merged":[]}
["識別子","内容","メモ","記入要領","基本ルール"]
["SN:",null,"Version 20220415-2","シート番号。DB登録時に割り当てるので記入不要","・「セルの結合」は使わない。データや計算が見かけとずれる危険が高い"]
[" ",null,null,null,"・必要な情報のみ入力すればよい"]
["基本情報:[GeneralInformation]",null,null,null,"・タグ名は \"英数字-_\" + \":\""]
["[組織ID]OrganizationID:","東工大:TokyoTech:"," "," ","・タグ名の前には []で囲んで説明を入れられる ([、]は使えない)。そのあとにタグ名を続ける"]
["[グループID]GroupID:","神谷・片瀬研"," "," ","・各タグには、検索・データ処理可能な「内容」と、任意書式の「メモ」があり、いずれもDBに取り入れる。メモのタグ名は [TAG]_MEMO"]
["[実験者ID]PersonID:",null,null,null,"・Loop: ～ EndLoop: でまとめたブロックの情報は、同じタグで複数記載可能"]
["[実験者名]PersonName:",null,null,"PersonIDで区別できる場合は記入不要","・タグはすべてリスト化(配列化)してDBに取り込む"]
[" ",null,null,null,"　そのため、シート内に同じタグが使われても構わない"]
["[年月日]Date:",null,null,"yyyy/mm/dd","・試料名、シーケンスなど、複数の内容がある場合は、改行あるいは,で区切る。"]
["[実験開始時刻]StartTime:",null,null,"hh:mm(:ss)","　各データの先頭、最後の空白は削除される"]
[" "]
["[部屋]Room:","COE-2F",null,"フリーフォーマット","・Loop:下の最初のSampleID:より上の行の項目の変更はしない（マクロに影響がでるため）"]
[" "]
["[天気]Weather:","晴",null,"晴|曇|雨の組み合わせ","・「内容」例はイタリックで記入"]
["[温度]Temperature:"," 25C(9:00)-27C(12:00)-30C",null,"単位は C (℃)。時刻などと一緒に記録してよい"]
["[湿度]Moisture:",null,null,"単位は %。時刻などと一緒に記録してよい"]
["[実験終了時刻]EndTime:"]
["[実験概要]ExperimentalDescription:",null,null,"合成、XRD測定など"]
[" "," "]
["Loop:試料情報:[SampleInformation]",null,null,"複数の情報を同じタグを使って記載できる"]
["[作製した試料の情報]SampleInformation:","InGaZnO4, アモルファス",null,"化学式、試料の構造、工夫点などを\n改行や , で区切って記述"]
["[作製した試料名(ID)]SampleID:"]
["[製膜装置ID]ApparatusID:","Sputtering",null,"PLD, Sputteringなど"]
["[ターゲット試料ID]TargetID:","MS0001-01,MS0001-02\nMS0002",null,"改行や , で区切って複数指定可能\n例えば同じ行には、同じロットの試料を枝番で分ける\n異なる行の試料は別の条件・ロットの試料 などの区別が可能"]
["[製膜プログラム]Film growth Program:",null,null,"シーケンスを一行ごとに書く\nシーケンスの最初は開始温度、最後は終了温度\n開始温度と終了温度の間に雰囲気、時間等の条件を入れる。\n条件の数値は単位で区別できるようにする\n各シーケンスには':'で終了するタグをつけられる"]
["[基板]substrate"]
["[基板温度]sub.temperature"]
["[背圧]base pressure:"]
["[パワー]power:"]
["[全圧]total pressure:"]
["[反応性ガス] reactive gas:"]
["[全流量]total gas flow:"]
["[成膜時間]time:"]
["[TS距離]T-S distance:"]
["[成膜後処理]Post-deposition process"]
["[furnace]使用炉:"]
["[gas]加熱雰囲気:"]
["[temperature]設定温度:"]
["[rise-time]昇温時間:"]
["[keep-time]保持時間:"]
["[cool-time]冷却時間:"]
[]
[]
["[データファイル]DataFilePath:","Kamiya/20220224-MS0001-Combi.xlsx",null,"並列合成をした場合などのファイル"]
["EndLoop:試料情報:[SampleInformation]"]
[]
["その他情報:[OtherInformation]",null,null,"これより下は、標準以外のタグ"]
[]
["[メモ]Memo:"," 表面がツヤツヤしてた",null,"自由記述"]
[]
["[修正記録]UpdateRecord:"]

{"sheet":"選択肢","index":1,"n_rows":13,"n_cols":13,"rows_kept":13,"cut":false,"hidden":false,"merged":[]}
["組織ID","グループID","実験者ID","実験室ID","実験の分類","製膜方法","成膜装置","スパッタ条件","PLD条件","MBE条件","後処理","加熱条件","電極成膜条件"]
["選択してください","選択してください","選択してください","選択してください","選択してください","PLD","ANRLVAスパッタ","[基板]substrate:","[基板]substrate:","[基板]substrate:","postanneal","[furnace]使用炉:","装置"]
["東工大:TokyoTech:","神谷・片瀬研","神谷利夫","R3-301","合成:Synthesis:","Sputtering","kenixスパッタ(小)","[基板温度]sub.temperature(C):","[基板温度]sub.temperature(C):","[基板温度]sub.temperature(C):","electrode","[gas]加熱雰囲気:","[金属]metal:"]
["NIMS:",null,"片瀬貴義","S8-5F","薄膜成長:FilmGrowth:","MBE","kenixスパッタ(大)","[背圧]base pressure(Pa):","[背圧]base pressure(Pa):","[背圧]base pressure(Pa):",null,"[temperature]設定温度(C):","[膜厚]thickness:"]
["KEK:",null,"井手啓介","COE-1F","計測:Measurement:","MOCVD","UHVスパッタ","[パワー]power(W):","[レーザーパワー]laser power(mJ):","[セル1元素]cell1 element:",null,"[rise-time]昇温時間(min):","[電極幅]width:"]
["JFCC:",null,"清水篤","COE-2F","XRD測定:XRD:","Solution","カルコゲンPLD","[全圧]total pressure(Pa):","[周波数]frequency(Hz):","[セル1温度]cell1 temperature(C):",null,"[keep-time]保持時間(min):","[電極長さ]length:"]
[null,null,null,"R3-202","PES測定:PES:",null,"パスカルPLD","[反応性ガス] reactive gas:","[成膜時間]time(min):","[セル1圧力]cell1 pressure(Pa):",null,"[cool-time]冷却時間(min):","[背圧]base pressure:"]
[null,null,null,"R3-206","計算:Calculation:",null,"ULVACPLD","[反応性ガス割合]reactive gas ratio(%):","[全圧]total pressure(Pa):","[セル2元素]cell2 element:",null,null,"[パワー]power:"]
[null,null,null,"R3-213",null,null,"酸化物PLD","[全流量]total gas flow(sccm):","[ガス]gas:","[セル2温度]cell2 temperature(C):",null,null,"[全圧]total pressure:"]
[null,null,null,null,null,null,"有害物PLD","[成膜時間]time(min):","[全流量]total gas flow(sccm):","[セル2圧力]cell2 pressure(Pa):",null,null,"[ガス] gas:"]
[null,null,null,null,null,null,"カルコゲンMBE","[TS距離]T-S distance(cm):","[反応性ガス割合]reactive gas ratio(%):","[セル3元素]cell3 element:",null,null,"[全流量]total gas flow:"]
[null,null,null,null,null,null,null,null,null,"[セル3温度]cell3 temperature(C):",null,null,"[成膜時間]time:"]
[null,null,null,null,null,null,null,null,null,"[セル3圧力]cell3 pressure(Pa):",null,null,"[TS距離]T-S distance:"]